The Data Acquisition System (DAQ) enables the measurement of process fluid temperatures in real time.

The DAQ system was originally developed for Plasma Etch wafer chuck/ESC process cooling loops. However, it can be adapted to capture real-time fluid temperature measurements on any tool using a fluid medium. We have successfully utilized this approach on Etch and CVD chamber walls and/or CVD chamber domes.

These calorimetric measurements provide fluid temperature profile data that can be directly correlated to the performance of the existing temperature control system (chiller) and illustrate its ability to effectively manage the heat load for a given application.

The "DAQ" evaluation process provides our customers with informative, comparative and often revealing fluid temperature data from their process chambers. LAUDA-Noah applications engineers use this data to demonstrate the benefits of Dynamic Temperature Control in any temperature sensitive process.

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